n&k Technology Inc.✓ Verified

n&k Technology, Inc., of San Jose, California, was founded in 1992 by Drs. Rahim Forouhi and Iris Bloomer. The company manufactures exceptionally high resolution, state-of-the-art scatterometry (OCD) and thin film metrology tools for the semiconductor, photomask, data storage, flat panel display and solar cell industries. n&k’s large family of tools provide measurements for a large range of OCD and thin film structures that cover current and future applications, and are used for the most challenging applications of today’s high tech industries. Start with excellent raw data with optimized signal-to-noise ratio over the widest possible wavelength range, either from 190nm –1,000nm or 190nm – 15,000nm. Optical design involves n&k’s patented reflective optics to optimize the number of photons (signal) reaching the detector, thus creating excellent signal-to-noise of the measured raw data. The physically valid Forouhi-Bloomer (F-B) Dispersion Equations for n and k , are utilized for thin film analysis. The F-B equations are combined with the physically valid Rigorous Coupled Wave Analysis (RCWA) for analysis of OCD structures (2D trenches and 3D holes). Accurate and precise measureme

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